FTO Thin Films: Outcome of Substrate Temperature on the Structural and Optical Properties

Suresh R; Indira Priyadharshini T; Yogeshwaran A; Govindasamy S

doi:10.34256/famr2222

Suresh R a Department of Physics, Sri Ramakrishna Mission Vidyalaya College of Arts and Science, Coimbatore - 641 020, Tamil Nadu, India.
Indira Priyadharshini T a Department of Physics, Sri Ramakrishna Mission Vidyalaya College of Arts and Science, Coimbatore - 641 020, Tamil Nadu, India.
Yogeshwaran A a Department of Physics, Sri Ramakrishna Mission Vidyalaya College of Arts and Science, Coimbatore - 641 020, Tamil Nadu, India.
Govindasamy S Department of Physics, Sri Ramakrishna Mission Vidyalaya College of Arts and Science, Coimbatore - 641 020, Tamil Nadu, India.

Keywords: FTO, Ammonium Fluoride, UV-Vis, FT-IR

Abstract

In this work, Fluorine doped Tin Oxide (FTO) thin films are effectively deposited by JNSP technique using ammonium fluoride and tin chloride as solution composition. The influence of Substrate Temperature (ST) on the structural and optical properties of FTO thin films is investigated. XRD pattern authenticates the presence of single phase polycrystalline orthorhombic structure with favored orientation along (230) and (200) directions. The sharp band obtained between 475 and 700 cm^-1 originated from asymmetric stretching vibrations of metal oxide (SnO₂:F). The highest band gap energy was obtained as 3.57 eV at 425°C and lowest band gap energy was obtained as 3.49 eV at 450°C obtained from UV-Vis spectra.

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